Abstract
Atomically thin tungsten diselenide (WSe2) is a promising 2D semiconductor for nanoelectronics and optoelectronics. Using UV ozone and low-power O2 plasma treatments, it is demonstrated that the formation of WSe2(1−x)O2x (WSeyOx) leads to hysteretic behavior in vertical transport measurements and also enables to an improvement in the p-type transfer characteristics in lateral transport measurements. The amount of oxidation correlates well with the resistive switch behavior in oxidized WSe2/graphene, and WSeyOx formation under the electrical contact of the horizontal devices leads to increased p-branch on/off by 100×. In addition to its effect for residue removal, oxidation on field effect transistor channel also helps mitigate n-type dominated transfer characteristics of WSe2 commonly seen on sapphire. It is demonstrated that light oxidation of WSe2 is a multifunctional post-growth treatment that enables vertical resistive switch junctions, contact improvement, and continuous tuning of transistor transport properties.
Original language | English (US) |
---|---|
Article number | 2000422 |
Journal | Advanced Materials Interfaces |
Volume | 7 |
Issue number | 18 |
DOIs | |
State | Published - Sep 1 2020 |
All Science Journal Classification (ASJC) codes
- Mechanics of Materials
- Mechanical Engineering