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Modification of the Electronic Transport in Atomically Thin WSe2 by Oxidation

  • Yu Chuan Lin
  • , Brian M. Bersch
  • , Rafik Addou
  • , Ke Xu
  • , Qingxiao Wang
  • , Christopher M. Smyth
  • , Bhakti Jariwala
  • , Roger C. Walker
  • , Susan K. Fullerton-Shirey
  • , Moon J. Kim
  • , Robert M. Wallace
  • , Joshua A. Robinson

Research output: Contribution to journalArticlepeer-review

Abstract

Atomically thin tungsten diselenide (WSe2) is a promising 2D semiconductor for nanoelectronics and optoelectronics. Using UV ozone and low-power O2 plasma treatments, it is demonstrated that the formation of WSe2(1−x)O2x (WSeyOx) leads to hysteretic behavior in vertical transport measurements and also enables to an improvement in the p-type transfer characteristics in lateral transport measurements. The amount of oxidation correlates well with the resistive switch behavior in oxidized WSe2/graphene, and WSeyOx formation under the electrical contact of the horizontal devices leads to increased p-branch on/off by 100×. In addition to its effect for residue removal, oxidation on field effect transistor channel also helps mitigate n-type dominated transfer characteristics of WSe2 commonly seen on sapphire. It is demonstrated that light oxidation of WSe2 is a multifunctional post-growth treatment that enables vertical resistive switch junctions, contact improvement, and continuous tuning of transistor transport properties.

Original languageEnglish (US)
Article number2000422
JournalAdvanced Materials Interfaces
Volume7
Issue number18
DOIs
StatePublished - Sep 1 2020

All Science Journal Classification (ASJC) codes

  • Mechanics of Materials
  • Mechanical Engineering

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