Abstract
Fabrication of high aspect ratio structures of complex perovskite materials using photoresist templates is reported in this work. Water based (Pb,Ba)TiO3 (PBT) and 2-methoxyethanol based PbZr 0.52Ti0.48O3 (PZT) sol-gel precursor solutions were used to infiltrate prefabricated photoresist templates on various substrates. The solutions were deposited by vacuum infiltration assisted dip coating. Pyrolysis and the crystallization of the pillars were performed after removal of the gel layer formed on the surface of the mold. During crystallization process of photoresist was removed simultaneously. Various aspect ratio PZT and PBT structures were obtained.
Original language | English (US) |
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Pages | 258-261 |
Number of pages | 4 |
State | Published - Dec 6 2005 |
Event | 2004 14th IEEE International Symposium on Applications of Ferroelectrics, ISAF-04. A Conference of the IEEE Ultrasonics, Feroelectrics, and Frequency Control Society (UFFC-S) - Montreal, Canada Duration: Aug 23 2004 → Aug 27 2004 |
Other
Other | 2004 14th IEEE International Symposium on Applications of Ferroelectrics, ISAF-04. A Conference of the IEEE Ultrasonics, Feroelectrics, and Frequency Control Society (UFFC-S) |
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Country/Territory | Canada |
City | Montreal |
Period | 8/23/04 → 8/27/04 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering