Molecular beam epitaxy of Sm 2O 3, Dy 2O 3, and Ho 2O 3 on Si (111)

H. S. Craft, R. Collazo, Z. Sitar, J. P. Maria

Research output: Contribution to journalArticlepeer-review

7 Scopus citations


We report on the epitaxial deposition of Sm 2O 3, Dy 2O 3, and Ho 2O 3 films on Si (111) substrates as progress towards developing a predictive model for gate oxide selection. To date, films have been characterized by reflection high-energy electron diffraction, x-ray diffraction (XRD), and x-ray photoemission spectroscopy (XPS). In the case of Sm 2O 3, difficulty was encountered in achieving the growth of phase pure films; growth of the desired bixbyite oxide phase was accompanied by significant amounts of monoclinic oxide as detected by XRD. Dy 2O 3 and Ho 2O 3 films can be produced free of unwanted phases when deposited using a background pressure of 1 × 10 -6 torr O 2/O 3 and a substrate temperature between 425 and 550°C. Dy 2O 3 films with an x-ray peak width of 0.6° in ω were obtained. XPS studies of the Dy 2O 3/Si interface are in progress, and verify the phase purity of the films.

Original languageEnglish (US)
Pages (from-to)2105-2110
Number of pages6
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Issue number4
StatePublished - Jul 2006

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering


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