Molecular depth profiling of trehalose using a C                         60                          cluster ion beam

Andreas Wucher; Juan Cheng; Nicholas Winograd

doi:10.1016/j.apsusc.2008.05.248

Molecular depth profiling of trehalose using a C ₆₀ cluster ion beam

Andreas Wucher, Juan Cheng, Nicholas Winograd

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20 Scopus citations

Abstract

Molecular depth profiling of organic overlayers was performed using a mass selected fullerene ion beam in conjunction with time-of-flight (TOF-SIMS) mass spectrometry. The characteristics of depth profiles acquired on a 300-nm trehalose film on Si were studied as a function of the impact kinetic energy and charge state of the C ₆₀ projectile ions. We find that the achieved depth resolution depends only weakly upon energy.

Original language	English (US)
Pages (from-to)	959-961
Number of pages	3
Journal	Applied Surface Science
Volume	255
Issue number	4
DOIs	https://doi.org/10.1016/j.apsusc.2008.05.248
State	Published - Dec 15 2008

All Science Journal Classification (ASJC) codes

General Chemistry
Condensed Matter Physics
General Physics and Astronomy
Surfaces and Interfaces
Surfaces, Coatings and Films

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10.1016/j.apsusc.2008.05.248

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@article{3d47ed61d18b44ffb3b5e794d48d9ef6,

title = " Molecular depth profiling of trehalose using a C 60 cluster ion beam ",

abstract = " Molecular depth profiling of organic overlayers was performed using a mass selected fullerene ion beam in conjunction with time-of-flight (TOF-SIMS) mass spectrometry. The characteristics of depth profiles acquired on a 300-nm trehalose film on Si were studied as a function of the impact kinetic energy and charge state of the C 60 projectile ions. We find that the achieved depth resolution depends only weakly upon energy.",

author = "Andreas Wucher and Juan Cheng and Nicholas Winograd",

year = "2008",

month = dec,

day = "15",

doi = "10.1016/j.apsusc.2008.05.248",

language = "English (US)",

volume = "255",

pages = "959--961",

journal = "Applied Surface Science",

issn = "0169-4332",

publisher = "Elsevier B.V.",

number = "4",

}

TY - JOUR

T1 - Molecular depth profiling of trehalose using a C 60 cluster ion beam

AU - Wucher, Andreas

AU - Cheng, Juan

AU - Winograd, Nicholas

PY - 2008/12/15

Y1 - 2008/12/15

N2 - Molecular depth profiling of organic overlayers was performed using a mass selected fullerene ion beam in conjunction with time-of-flight (TOF-SIMS) mass spectrometry. The characteristics of depth profiles acquired on a 300-nm trehalose film on Si were studied as a function of the impact kinetic energy and charge state of the C 60 projectile ions. We find that the achieved depth resolution depends only weakly upon energy.

AB - Molecular depth profiling of organic overlayers was performed using a mass selected fullerene ion beam in conjunction with time-of-flight (TOF-SIMS) mass spectrometry. The characteristics of depth profiles acquired on a 300-nm trehalose film on Si were studied as a function of the impact kinetic energy and charge state of the C 60 projectile ions. We find that the achieved depth resolution depends only weakly upon energy.

UR - http://www.scopus.com/inward/record.url?scp=56449097682&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=56449097682&partnerID=8YFLogxK

U2 - 10.1016/j.apsusc.2008.05.248

DO - 10.1016/j.apsusc.2008.05.248

M3 - Article

AN - SCOPUS:56449097682

SN - 0169-4332

VL - 255

SP - 959

EP - 961

JO - Applied Surface Science

JF - Applied Surface Science

IS - 4

ER -

Molecular depth profiling of trehalose using a C ₆₀ cluster ion beam

Abstract

All Science Journal Classification (ASJC) codes

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