Molecular depth profiling of trehalose using a C                         60                          cluster ion beam

Andreas Wucher; Juan Cheng; Nicholas Winograd

doi:10.1016/j.apsusc.2008.05.248

Molecular depth profiling of trehalose using a C ₆₀ cluster ion beam

Andreas Wucher
, Juan Cheng
, Nicholas Winograd

Research output: Contribution to journal › Article › peer-review

20 Scopus citations

Abstract

Molecular depth profiling of organic overlayers was performed using a mass selected fullerene ion beam in conjunction with time-of-flight (TOF-SIMS) mass spectrometry. The characteristics of depth profiles acquired on a 300-nm trehalose film on Si were studied as a function of the impact kinetic energy and charge state of the C ₆₀ projectile ions. We find that the achieved depth resolution depends only weakly upon energy.

Original language	English (US)
Pages (from-to)	959-961
Number of pages	3
Journal	Applied Surface Science
Volume	255
Issue number	4
DOIs	https://doi.org/10.1016/j.apsusc.2008.05.248
State	Published - Dec 15 2008

All Science Journal Classification (ASJC) codes

General Chemistry
Condensed Matter Physics
General Physics and Astronomy
Surfaces and Interfaces
Surfaces, Coatings and Films

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10.1016/j.apsusc.2008.05.248

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title = " Molecular depth profiling of trehalose using a C 60 cluster ion beam ",

abstract = " Molecular depth profiling of organic overlayers was performed using a mass selected fullerene ion beam in conjunction with time-of-flight (TOF-SIMS) mass spectrometry. The characteristics of depth profiles acquired on a 300-nm trehalose film on Si were studied as a function of the impact kinetic energy and charge state of the C 60 projectile ions. We find that the achieved depth resolution depends only weakly upon energy.",

author = "Andreas Wucher and Juan Cheng and Nicholas Winograd",

year = "2008",

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T1 - Molecular depth profiling of trehalose using a C 60 cluster ion beam

AU - Wucher, Andreas

AU - Cheng, Juan

AU - Winograd, Nicholas

PY - 2008/12/15

Y1 - 2008/12/15

N2 - Molecular depth profiling of organic overlayers was performed using a mass selected fullerene ion beam in conjunction with time-of-flight (TOF-SIMS) mass spectrometry. The characteristics of depth profiles acquired on a 300-nm trehalose film on Si were studied as a function of the impact kinetic energy and charge state of the C 60 projectile ions. We find that the achieved depth resolution depends only weakly upon energy.

AB - Molecular depth profiling of organic overlayers was performed using a mass selected fullerene ion beam in conjunction with time-of-flight (TOF-SIMS) mass spectrometry. The characteristics of depth profiles acquired on a 300-nm trehalose film on Si were studied as a function of the impact kinetic energy and charge state of the C 60 projectile ions. We find that the achieved depth resolution depends only weakly upon energy.

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UR - https://www.scopus.com/pages/publications/56449097682#tab=citedBy

U2 - 10.1016/j.apsusc.2008.05.248

DO - 10.1016/j.apsusc.2008.05.248

M3 - Article

AN - SCOPUS:56449097682

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SP - 959

EP - 961

JO - Applied Surface Science

JF - Applied Surface Science

IS - 4

ER -

Molecular depth profiling of trehalose using a C ₆₀ cluster ion beam

Abstract

All Science Journal Classification (ASJC) codes

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