TY - JOUR
T1 - Molecular Level Ceramic/Polymer Composites. 2. Synthesis of Polymer-Trapped Silica and Titania Nanoclusters
AU - Nandi, Manish
AU - Conklin, Jeanine A.
AU - Sen, Ayusman
AU - Salvati, Lawrence
PY - 1991/1/1
Y1 - 1991/1/1
N2 - The concept of “site isolation” was used to synthesize SiO2 and TiO2 nanoclusters trapped in polyimide matrices. M(OEt)4 (M = Si, Ti) was added to polyamic solutions derived from 4, 4′-oxydianiline and either 1,2,4,5-benzenetetracarboxylic acid dianhydride or 3, 3′,4,4′-benzophenonetetracarboxylic acid dianhydride. Following thermal curing, polyimide films containing a homogeneous dispersion of SiO2 or TiO2 particles were obtained. Oxide nanoclusters (size <1-1.5 nm) were present in polyimide films containing 12% TiO2 and up to 32% SiO2. However, 1-μm particles were present at 42% SiO2 content. Two-micrometer particles were formed even in 12% SiO2 containing films when poly(diethoxysiloxane), rather than Si(OEt)4, was used as the oxide precursor.
AB - The concept of “site isolation” was used to synthesize SiO2 and TiO2 nanoclusters trapped in polyimide matrices. M(OEt)4 (M = Si, Ti) was added to polyamic solutions derived from 4, 4′-oxydianiline and either 1,2,4,5-benzenetetracarboxylic acid dianhydride or 3, 3′,4,4′-benzophenonetetracarboxylic acid dianhydride. Following thermal curing, polyimide films containing a homogeneous dispersion of SiO2 or TiO2 particles were obtained. Oxide nanoclusters (size <1-1.5 nm) were present in polyimide films containing 12% TiO2 and up to 32% SiO2. However, 1-μm particles were present at 42% SiO2 content. Two-micrometer particles were formed even in 12% SiO2 containing films when poly(diethoxysiloxane), rather than Si(OEt)4, was used as the oxide precursor.
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U2 - 10.1021/cm00013a040
DO - 10.1021/cm00013a040
M3 - Article
AN - SCOPUS:33751499409
SN - 0897-4756
VL - 3
SP - 201
EP - 206
JO - Chemistry of Materials
JF - Chemistry of Materials
IS - 1
ER -