TY - JOUR
T1 - Molecular ruler lithography using sacrificial host structures fabricated using electron beam lithography
AU - Subramanian, Shyamala
AU - Catchmark, Jeffrey M.
N1 - Funding Information:
This work was supported by the National Science Foundation under the Grant No. DMR 0213623, The National Science Foundation Cooperative Agreement No. 0335765, the National Nanotechnology Infrastructure Network, with Cornell University and the Pennsylvania State University Materials Research Institute.
PY - 2006/10
Y1 - 2006/10
N2 - Molecular ruler nanolithography combines conventional lithography techniques with chemical self-assembly methods to improve the resolution of the existing lithography tools. We demonstrate the implementation of molecular ruler nanolithography using sacrificial multilayer host structures defined by electron-beam lithography. Using this process, 40-nm metal features are produced using host features spaced 100 nm apart. Using a thicker sacrificial layer, 100-nm-thick daughter metal layers are also produced, demonstrating the flexibility of this technique.
AB - Molecular ruler nanolithography combines conventional lithography techniques with chemical self-assembly methods to improve the resolution of the existing lithography tools. We demonstrate the implementation of molecular ruler nanolithography using sacrificial multilayer host structures defined by electron-beam lithography. Using this process, 40-nm metal features are produced using host features spaced 100 nm apart. Using a thicker sacrificial layer, 100-nm-thick daughter metal layers are also produced, demonstrating the flexibility of this technique.
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U2 - 10.1117/1.2401140
DO - 10.1117/1.2401140
M3 - Article
AN - SCOPUS:33947171200
SN - 1537-1646
VL - 5
JO - Journal of Microlithography, Microfabrication and Microsystems
JF - Journal of Microlithography, Microfabrication and Microsystems
IS - 4
M1 - 049701
ER -