Molecular-ruler nanolithography

Charan Srinivasan; J. Nathan Hohman; Mary E. Anderson; Pengpeng Zhang; Paul S. Weiss; Mark W. Horn

doi:10.1117/12.712230

Molecular-ruler nanolithography

Charan Srinivasan, J. Nathan Hohman, Mary E. Anderson, Pengpeng Zhang, Paul S. Weiss, Mark W. Horn

Research output: Contribution to journal › Conference article › peer-review

3 Scopus citations

Abstract

Molecular-ruler nanolithography uses individual molecules as building blocks to create nanometer-scale features in a low-cost, high-throughput process. Self-assembled multilayers are used in combination with radiation-sensitive polymeric resists to interface nanometer-scale features with structures fabricated using conventional lithographic methods. This technique is advantageous for its high precision, parallel processing, and low capital investment. Here, we provide an overview of molecular-ruler nanolithography and describe how this technology is being applied to the creation of nanometer-scale devices, patterning of large-area sub-200-nm grating structures, and the fabrication of quartz templates for use as molds in imprint lithography.

Original language	English (US)
Article number	65171I
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	6517
Issue number	PART 1
DOIs	https://doi.org/10.1117/12.712230
State	Published - 2007
Event	Emerging Lithographic Technologies XI - San Jose, CA, United States Duration: Feb 27 2007 → Mar 1 2007

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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10.1117/12.712230

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title = "Molecular-ruler nanolithography",

abstract = "Molecular-ruler nanolithography uses individual molecules as building blocks to create nanometer-scale features in a low-cost, high-throughput process. Self-assembled multilayers are used in combination with radiation-sensitive polymeric resists to interface nanometer-scale features with structures fabricated using conventional lithographic methods. This technique is advantageous for its high precision, parallel processing, and low capital investment. Here, we provide an overview of molecular-ruler nanolithography and describe how this technology is being applied to the creation of nanometer-scale devices, patterning of large-area sub-200-nm grating structures, and the fabrication of quartz templates for use as molds in imprint lithography.",

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AU - Srinivasan, Charan

AU - Hohman, J. Nathan

AU - Anderson, Mary E.

AU - Zhang, Pengpeng

AU - Weiss, Paul S.

AU - Horn, Mark W.

PY - 2007

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N2 - Molecular-ruler nanolithography uses individual molecules as building blocks to create nanometer-scale features in a low-cost, high-throughput process. Self-assembled multilayers are used in combination with radiation-sensitive polymeric resists to interface nanometer-scale features with structures fabricated using conventional lithographic methods. This technique is advantageous for its high precision, parallel processing, and low capital investment. Here, we provide an overview of molecular-ruler nanolithography and describe how this technology is being applied to the creation of nanometer-scale devices, patterning of large-area sub-200-nm grating structures, and the fabrication of quartz templates for use as molds in imprint lithography.

AB - Molecular-ruler nanolithography uses individual molecules as building blocks to create nanometer-scale features in a low-cost, high-throughput process. Self-assembled multilayers are used in combination with radiation-sensitive polymeric resists to interface nanometer-scale features with structures fabricated using conventional lithographic methods. This technique is advantageous for its high precision, parallel processing, and low capital investment. Here, we provide an overview of molecular-ruler nanolithography and describe how this technology is being applied to the creation of nanometer-scale devices, patterning of large-area sub-200-nm grating structures, and the fabrication of quartz templates for use as molds in imprint lithography.

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Molecular-ruler nanolithography

Abstract

All Science Journal Classification (ASJC) codes

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