Keyphrases
Molybdenum
100%
Schottky Contact
100%
Carbonitride
100%
Plasma-enhanced Atomic Layer Deposition (PEALD)
100%
Gallium Nitride
100%
Remote Plasma
66%
Energy Dispersive X-ray Spectroscopy
33%
Grazing Incidence X-ray Diffraction (GIXRD)
33%
Transmission Electron Microscopy
33%
Annealing
33%
X-ray Photoelectron Spectroscopy
33%
Ideality Factor
33%
Barrier Height
33%
Schottky Diode
33%
Pure Metals
33%
Lattice Parameter
33%
Rectifying Behavior
33%
Diode
33%
Dimethylamino
33%
Film Composition
33%
Selected Area Electron Diffraction
33%
Plan-view
33%
Work Function Engineering
33%
Metal Nitrides
33%
H2 Plasma
33%
Process-induced Defects
33%
Material Science
Molybdenum
100%
Gallium Nitride
100%
Schottky Barrier
100%
Carbon Nitride
100%
Film
66%
Transmission Electron Microscopy
33%
Annealing
33%
Nitride Compound
33%
Schottky Diode
33%
Lattice Constant
33%
Photoemission Spectroscopy
33%
Selected Area Diffraction
33%
Physics
Carbon Nitride
100%
Metal Nitrides
20%