MUO16- Deposition methods of BiFeO₃ thin films

Keyphrases

• Chemical Solution Deposition 100%
• Deposition Methods 100%
• BiFeO3 Thin Film 100%
• Bismuth 66%
• Microstructure 66%
• Annealing 66%
• Surface Roughness 66%
• BiFeO3 66%
• BiFeO3 Film 66%
• Bismuth Oxide 66%
• Physical Vapor Deposition 66%
• X Ray Diffraction 33%
• Porosity 33%
• Phase-pure 33%
• Crack-free 33%
• Perovskite 33%
• Silicon Substrate 33%
• Transition Temperature 33%
• Atomic Force Microscopy 33%
• Hot Plate 33%
• Root Mean Square 33%
• Crystallization Behavior 33%
• Polycrystalline Films 33%
• Sapphire Substrate 33%
• Ferroelectric Transition 33%
• Sol-gel Process 33%
• Multiferroics 33%
• Phase Purity 33%
• RF Sputtering 33%
• Above Room Temperature 33%
• Iridium 33%
• Antiferromagnetic Transition 33%
• Sputtered Films 33%
• Adapted M-solutions 33%
• Phase Assemblage 33%
• Crystallographic Phase 33%
• Non-perovskite 33%

Material Science

• Film 100%
• Thin Films 100%
• Bismuth Ferrite 100%
• Bismuth 50%
• Solution (Chemistry) 37%
• Surface Roughness 25%
• Iron Oxide 25%
• Physical Vapor Deposition 25%
• X-Ray Diffraction 12%
• Silicon 12%
• Ferroelectric Material 12%
• Sol-Gel 12%
• Scanning Electron Microscopy 12%
• Sapphire 12%
• Multiferroic Material 12%
• Iridium 12%
• Sputtered Film 12%
• Atomic Force Microscopy 12%