N-face metal-insulator-semiconductor high-electron-mobility transistors with AlN back-barrier

Man Hoi Wong, Yi Pei, Rongming Chu, Siddharth Rajan, Brian L. Swenson, David F. Brown, Stacia Keller, Steven P. DenBaars, James S. Speck, Umesh K. Mishra

Research output: Contribution to journalArticlepeer-review

41 Scopus citations


We present a high-performance SiN/AlGaN (cap)/GaN (channel)/AlN (barrier)/GaN (buffer) metal-insulator-semiconductor high-electron-mobility transistor grown on the N-face, in which the 2-D electron gas (2DEG) is induced at the top GaN/AlN interface. The use of AlN eliminates alloy disorder scattering to the 2DEG and provides strong back-barrier confinement of the 2DEG under high electric fields for device scaling. Devices with 0.7-μ gate length showed a current-gain cutoff frequency (fT) of 17 GHz and a power-gain cutoff frequency (fmax) of 37 GHz. A continuous-wave output power density of 7.1 W/mm was measured at 4 GHz, with 58% power-added efficiency and a large-signal gain of 15.3 dB at a drain bias of 35 V.

Original languageEnglish (US)
Pages (from-to)1101-1104
Number of pages4
JournalIEEE Electron Device Letters
Issue number10
StatePublished - 2008

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering


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