Nano- and micro-scale morghological defects in oxidized a-SiC: H thin films

Keyphrases

• Structural Reconstruction 100%
• Low Density 50%
• Amorphous Carbon 50%
• RF Magnetron Sputtering 50%
• Silicon Substrate 50%
• Local Structure 50%
• Scanning Electron Microscopy 50%
• Atomic Force Microscopy 50%
• Electron Beam Scanning 50%
• Argon 50%
• Tensile Stress 50%
• Thermal Oxidation 50%
• Partial Oxidation 50%
• Mechanical Stress 50%
• Morphological Defects 50%
• Surface Morphology 50%
• Gas Mixture 50%
• Carbon-rich 50%
• Auger Electron Spectroscopy 50%
• Morphological Reconstruction 50%
• Carbon Species 50%
• Methane Gas 50%
• Stress Generation 50%
• Scanning System 50%

Material Science

• Thin Films 100%
• Oxidation Reaction 100%
• Film 66%
• Density 66%
• Amorphous Material 66%
• Silicon 33%
• Amorphous Carbon 33%
• Magnetron Sputtering 33%
• Scanning Electron Microscopy 33%
• Morphology 33%
• Ultimate Tensile Strength 33%
• Mechanical Stress 33%
• Gas Mixture 33%
• Surface Morphology 33%
• Partial Oxidation 33%