Nanostructures using self-assembled multilayers as molecular rulers and etch resists

C. Srinivasan; J. N. Hohman; M. E. Anderson; P. S. Weiss; M. W. Horn

doi:10.1116/1.2811712

Nanostructures using self-assembled multilayers as molecular rulers and etch resists

C. Srinivasan, J. N. Hohman, M. E. Anderson, P. S. Weiss, M. W. Horn

Research output: Contribution to journal › Article › peer-review

7 Scopus citations

Abstract

Self-assembled multilayers, composed of alternating layers of α,ω -mercaptoalkanoic acids and Cu2+ ions ("molecular rulers"), are used as organic sidewall spacers and etch resists for the fabrication of registered microstructures with precisely tailored nanometer-scale spacings. The method outlined here eases the stringency of the lithographic processing for patterning second-generation features. Additionally, a new method to lift off the self-assembled multilayered films for the generation of the tailored nanogaps is demonstrated. The advantages of these techniques are discussed.

Original language	English (US)
Pages (from-to)	1985-1988
Number of pages	4
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	25
Issue number	6
DOIs	https://doi.org/10.1116/1.2811712
State	Published - 2007

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Electrical and Electronic Engineering

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10.1116/1.2811712

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title = "Nanostructures using self-assembled multilayers as molecular rulers and etch resists",

abstract = "Self-assembled multilayers, composed of alternating layers of α,ω -mercaptoalkanoic acids and Cu2+ ions ({"}molecular rulers{"}), are used as organic sidewall spacers and etch resists for the fabrication of registered microstructures with precisely tailored nanometer-scale spacings. The method outlined here eases the stringency of the lithographic processing for patterning second-generation features. Additionally, a new method to lift off the self-assembled multilayered films for the generation of the tailored nanogaps is demonstrated. The advantages of these techniques are discussed.",

author = "C. Srinivasan and Hohman, {J. N.} and Anderson, {M. E.} and Weiss, {P. S.} and Horn, {M. W.}",

note = "Funding Information: This research has been funded by the Penn State Materials Research Institute, Penn State Nanofabrication Facility, and Penn State Center for Nanoscale Science, a NSF-funded Materials Research Science and Engineering Center. Parts of this work were conducted at the Penn State node of the NSF-funded National Nanotechnology Infrastructure Network. The authors would like to thank the Weiss group members and the Penn State Nanofabrication Center staff for helpful interactions and discussions.",

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T1 - Nanostructures using self-assembled multilayers as molecular rulers and etch resists

AU - Srinivasan, C.

AU - Hohman, J. N.

AU - Anderson, M. E.

AU - Weiss, P. S.

AU - Horn, M. W.

N1 - Funding Information: This research has been funded by the Penn State Materials Research Institute, Penn State Nanofabrication Facility, and Penn State Center for Nanoscale Science, a NSF-funded Materials Research Science and Engineering Center. Parts of this work were conducted at the Penn State node of the NSF-funded National Nanotechnology Infrastructure Network. The authors would like to thank the Weiss group members and the Penn State Nanofabrication Center staff for helpful interactions and discussions.

PY - 2007

Y1 - 2007

N2 - Self-assembled multilayers, composed of alternating layers of α,ω -mercaptoalkanoic acids and Cu2+ ions ("molecular rulers"), are used as organic sidewall spacers and etch resists for the fabrication of registered microstructures with precisely tailored nanometer-scale spacings. The method outlined here eases the stringency of the lithographic processing for patterning second-generation features. Additionally, a new method to lift off the self-assembled multilayered films for the generation of the tailored nanogaps is demonstrated. The advantages of these techniques are discussed.

AB - Self-assembled multilayers, composed of alternating layers of α,ω -mercaptoalkanoic acids and Cu2+ ions ("molecular rulers"), are used as organic sidewall spacers and etch resists for the fabrication of registered microstructures with precisely tailored nanometer-scale spacings. The method outlined here eases the stringency of the lithographic processing for patterning second-generation features. Additionally, a new method to lift off the self-assembled multilayered films for the generation of the tailored nanogaps is demonstrated. The advantages of these techniques are discussed.

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ER -

Nanostructures using self-assembled multilayers as molecular rulers and etch resists

Abstract

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