Nanostructures using self-assembled multilayers as molecular rulers and etch resists

C. Srinivasan, J. N. Hohman, M. E. Anderson, P. S. Weiss, M. W. Horn

Research output: Contribution to journalArticlepeer-review

6 Scopus citations


Self-assembled multilayers, composed of alternating layers of α,ω -mercaptoalkanoic acids and Cu2+ ions ("molecular rulers"), are used as organic sidewall spacers and etch resists for the fabrication of registered microstructures with precisely tailored nanometer-scale spacings. The method outlined here eases the stringency of the lithographic processing for patterning second-generation features. Additionally, a new method to lift off the self-assembled multilayered films for the generation of the tailored nanogaps is demonstrated. The advantages of these techniques are discussed.

Original languageEnglish (US)
Pages (from-to)1985-1988
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Issue number6
StatePublished - 2007

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering


Dive into the research topics of 'Nanostructures using self-assembled multilayers as molecular rulers and etch resists'. Together they form a unique fingerprint.

Cite this