Abstract
The use of silanes and their organo-derivatives as precursors and dopants in chemical vapor deposition (CVD) to prepare (modified) thin films with unique surface properties is becoming popular. However, as film growth is capital intensive and mechanistically complex, while film characterization is time-consuming and often requires sophisticated instrumentation, a technique requiring a minimum of time and sample to provide information directly related to aspects of the film growth processes is needed. This article reports a study being conducted to determine the suitability of mass spectroscopy as a precursor screening tool.
Original language | English (US) |
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Pages (from-to) | 81-86 |
Number of pages | 6 |
Journal | Materials Research Society Symposium - Proceedings |
Volume | 377 |
DOIs | |
State | Published - 1995 |
Event | Proceedings of the 1995 MRS Spring Meeting - San Francisco, CA, USA Duration: Apr 17 1995 → Apr 21 1995 |
All Science Journal Classification (ASJC) codes
- General Materials Science
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering