NICHROME RESISTOR FAILURES AS STUDIED BY X-RAY PHOTOELECTRON SPECTROSCOPY (XPS OR ESCA).

W. E. Baitinger; N. Winograd; J. W. Amy; J. A. Munarin

doi:10.1109/irps.1974.362619

NICHROME RESISTOR FAILURES AS STUDIED BY X-RAY PHOTOELECTRON SPECTROSCOPY (XPS OR ESCA).

W. E. Baitinger, N. Winograd, J. W. Amy, J. A. Munarin

Chemistry

Research output: Contribution to conference › Paper › peer-review

3 Scopus citations

Abstract

Depth profiles yielding both information on oxidation state and elemental composition have been obtained for model nichrome films by using x-ray photoelectron spectroscopy and argon ion sputtering. Evidence is presented showing the formation of thin insulating films at the interface between two metals caused by solid state reactions occurring between metals and metal oxides.

Original language	English (US)
Pages	1-6
Number of pages	6
DOIs	https://doi.org/10.1109/irps.1974.362619
State	Published - 1974
Event	Reliab Phys Symp, 12th Annu, Proc - Las Vegas, NV, USA Duration: Apr 2 1974 → Apr 4 1974

Other

Other	Reliab Phys Symp, 12th Annu, Proc
City	Las Vegas, NV, USA
Period	4/2/74 → 4/4/74

All Science Journal Classification (ASJC) codes

General Engineering

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10.1109/irps.1974.362619

Cite this

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title = "NICHROME RESISTOR FAILURES AS STUDIED BY X-RAY PHOTOELECTRON SPECTROSCOPY (XPS OR ESCA).",

abstract = "Depth profiles yielding both information on oxidation state and elemental composition have been obtained for model nichrome films by using x-ray photoelectron spectroscopy and argon ion sputtering. Evidence is presented showing the formation of thin insulating films at the interface between two metals caused by solid state reactions occurring between metals and metal oxides.",

author = "Baitinger, {W. E.} and N. Winograd and Amy, {J. W.} and Munarin, {J. A.}",

year = "1974",

doi = "10.1109/irps.1974.362619",

language = "English (US)",

pages = "1--6",

note = "Reliab Phys Symp, 12th Annu, Proc ; Conference date: 02-04-1974 Through 04-04-1974",

}

TY - CONF

T1 - NICHROME RESISTOR FAILURES AS STUDIED BY X-RAY PHOTOELECTRON SPECTROSCOPY (XPS OR ESCA).

AU - Baitinger, W. E.

AU - Winograd, N.

AU - Amy, J. W.

AU - Munarin, J. A.

PY - 1974

Y1 - 1974

N2 - Depth profiles yielding both information on oxidation state and elemental composition have been obtained for model nichrome films by using x-ray photoelectron spectroscopy and argon ion sputtering. Evidence is presented showing the formation of thin insulating films at the interface between two metals caused by solid state reactions occurring between metals and metal oxides.

AB - Depth profiles yielding both information on oxidation state and elemental composition have been obtained for model nichrome films by using x-ray photoelectron spectroscopy and argon ion sputtering. Evidence is presented showing the formation of thin insulating films at the interface between two metals caused by solid state reactions occurring between metals and metal oxides.

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UR - http://www.scopus.com/inward/citedby.url?scp=0016321556&partnerID=8YFLogxK

U2 - 10.1109/irps.1974.362619

DO - 10.1109/irps.1974.362619

M3 - Paper

AN - SCOPUS:0016321556

SP - 1

EP - 6

T2 - Reliab Phys Symp, 12th Annu, Proc

Y2 - 2 April 1974 through 4 April 1974

ER -

NICHROME RESISTOR FAILURES AS STUDIED BY X-RAY PHOTOELECTRON SPECTROSCOPY (XPS OR ESCA).

Abstract

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All Science Journal Classification (ASJC) codes

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