Abstract
Depth profiles yielding both information on oxidation state and elemental composition have been obtained for model nichrome films by using x-ray photoelectron spectroscopy and argon ion sputtering. Evidence is presented showing the formation of thin insulating films at the interface between two metals caused by solid state reactions occurring between metals and metal oxides.
| Original language | English (US) |
|---|---|
| Pages | 1-6 |
| Number of pages | 6 |
| DOIs | |
| State | Published - 1974 |
| Event | Reliab Phys Symp, 12th Annu, Proc - Las Vegas, NV, USA Duration: Apr 2 1974 → Apr 4 1974 |
Other
| Other | Reliab Phys Symp, 12th Annu, Proc |
|---|---|
| City | Las Vegas, NV, USA |
| Period | 4/2/74 → 4/4/74 |
All Science Journal Classification (ASJC) codes
- General Engineering
Fingerprint
Dive into the research topics of 'NICHROME RESISTOR FAILURES AS STUDIED BY X-RAY PHOTOELECTRON SPECTROSCOPY (XPS OR ESCA).'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver