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Optical and x-ray alignment approaches for off-plane reflection gratings

  • Ryan Allured
  • , Benjamin D. Donovan
  • , Casey T. DeRoo
  • , Hannah R. Marlowe
  • , Randall L. McEntaffer
  • , James H. Tutt
  • , Peter N. Cheimets
  • , Edward Hertz
  • , Randall K. Smith
  • , Vadim Burwitz
  • , Gisela Hartner
  • , Benedikt Menz

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Off-plane reflection gratings offer the potential for high-resolution, high-throughput X-ray spectroscopy on future missions. Typically, the gratings are placed in the path of a converging beam from an X-ray telescope. In the off-plane reflection grating case, these gratings must be co-aligned such that their diffracted spectra overlap at the focal plane. Misalignments degrade spectral resolution and effective area. In-situ X-ray alignment of a pair of off-plane reflection gratings in the path of a silicon pore optics module has been performed at the MPE PANTER beamline in Germany. However, in-situ X-ray alignment may not be feasible when assembling all of the gratings required for a satellite mission. In that event, optical methods must be developed to achieve spectral alignment. We have developed an alignment approach utilizing a Shack-Hartmann wavefront sensor and diffraction of an ultraviolet laser. We are fabricating the necessary hardware, and will be taking a prototype grating module to an X-ray beamline for performance testing following assembly and alignment.

Original languageEnglish (US)
Title of host publicationOptics for EUV, X-Ray, and Gamma-Ray Astronomy VII
EditorsGiovanni Pareschi, Stephen L. O'Dell, Giovanni Pareschi, Stephen L. O'Dell
PublisherSPIE
ISBN (Electronic)9781628417692, 9781628417692
DOIs
StatePublished - 2015
EventOptics for EUV, X-Ray, and Gamma-Ray Astronomy VII - San Diego, United States
Duration: Aug 10 2015Aug 13 2015

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume9603
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Other

OtherOptics for EUV, X-Ray, and Gamma-Ray Astronomy VII
Country/TerritoryUnited States
CitySan Diego
Period8/10/158/13/15

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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