Abstract
Molecular dynamics computer simulations have been employed to elucidate mechanisms responsible for uplifting of a monolayer of benzene and polystyrene molecules adsorbed on Ag{1 1 1} by low-energy atomic and cluster Ar projectiles. The sputtering yield and mass distributions of ejected particles are analyzed depending on the type and the kinetic energy of a projectile. It is shown that the relative contribution of intact molecules can be greatly enhanced if the kinetic energy of atomic projectile is reduced below 60 eV. At these energies, however, the efficiency of desorption is low and the ejection process is limited only to loosely bound molecules. Much better results can be obtained for cluster projectiles containing hundreds of Ar atoms with the incident energy of a few eV per atom. The impact of such particles leads to a gentle and very efficient removal of intact organic molecules originally adsorbed at the surface.
Original language | English (US) |
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Pages (from-to) | 1233-1237 |
Number of pages | 5 |
Journal | Vacuum |
Volume | 81 |
Issue number | 10 |
DOIs | |
State | Published - Jun 15 2007 |
All Science Journal Classification (ASJC) codes
- Instrumentation
- Condensed Matter Physics
- Surfaces, Coatings and Films