Oxidation kinetics in La0.67Ba0.33MnO3-δ epitaxy on SrTiO3 (001) during pulsed-laser deposition

X. D. Zhu; Weidong Si; X. X. Xi; Qi Li; Q. D. Jiang; M. G. Medici

doi:10.1063/1.124154

Oxidation kinetics in La_0.67Ba_0.33MnO_3-δ epitaxy on SrTiO₃ (001) during pulsed-laser deposition

X. D. Zhu, Weidong Si, X. X. Xi, Qi Li, Q. D. Jiang, M. G. Medici

Research output: Contribution to journal › Article › peer-review

16 Scopus citations

Abstract

The oblique-incidence optical reflectance difference technique is developed for monitoring in real time the kinetics of thin film epitaxy under high ambient pressure. In the case of La_0.67Ba_0.33MnO_3-δ (LMBO) epitaxy on SrTiO₃ (STO) (001), the study shows both qualitatively and quantitatively that the oxidation reaction is the rate-limiting step of the growth under the commonly used pulsed-laser deposition conditions. The kinetics parameters obtained are important for devising the growth strategy to make full oxygenated LBMO epitaxial films.

Original language	English (US)
Pages (from-to)	3540-3542
Number of pages	3
Journal	Applied Physics Letters
Volume	74
Issue number	23
DOIs	https://doi.org/10.1063/1.124154
State	Published - Jun 7 1999

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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title = "Oxidation kinetics in La0.67Ba0.33MnO3-δ epitaxy on SrTiO3 (001) during pulsed-laser deposition",

abstract = "The oblique-incidence optical reflectance difference technique is developed for monitoring in real time the kinetics of thin film epitaxy under high ambient pressure. In the case of La0.67Ba0.33MnO3-δ (LMBO) epitaxy on SrTiO3 (STO) (001), the study shows both qualitatively and quantitatively that the oxidation reaction is the rate-limiting step of the growth under the commonly used pulsed-laser deposition conditions. The kinetics parameters obtained are important for devising the growth strategy to make full oxygenated LBMO epitaxial films.",

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AU - Zhu, X. D.

AU - Si, Weidong

AU - Xi, X. X.

AU - Li, Qi

AU - Jiang, Q. D.

AU - Medici, M. G.

PY - 1999/6/7

Y1 - 1999/6/7

N2 - The oblique-incidence optical reflectance difference technique is developed for monitoring in real time the kinetics of thin film epitaxy under high ambient pressure. In the case of La0.67Ba0.33MnO3-δ (LMBO) epitaxy on SrTiO3 (STO) (001), the study shows both qualitatively and quantitatively that the oxidation reaction is the rate-limiting step of the growth under the commonly used pulsed-laser deposition conditions. The kinetics parameters obtained are important for devising the growth strategy to make full oxygenated LBMO epitaxial films.

AB - The oblique-incidence optical reflectance difference technique is developed for monitoring in real time the kinetics of thin film epitaxy under high ambient pressure. In the case of La0.67Ba0.33MnO3-δ (LMBO) epitaxy on SrTiO3 (STO) (001), the study shows both qualitatively and quantitatively that the oxidation reaction is the rate-limiting step of the growth under the commonly used pulsed-laser deposition conditions. The kinetics parameters obtained are important for devising the growth strategy to make full oxygenated LBMO epitaxial films.

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Oxidation kinetics in La_0.67Ba_0.33MnO_3-δ epitaxy on SrTiO₃ (001) during pulsed-laser deposition

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