Abstract
The oblique-incidence optical reflectance difference technique is developed for monitoring in real time the kinetics of thin film epitaxy under high ambient pressure. In the case of La0.67Ba0.33MnO3-δ (LMBO) epitaxy on SrTiO3 (STO) (001), the study shows both qualitatively and quantitatively that the oxidation reaction is the rate-limiting step of the growth under the commonly used pulsed-laser deposition conditions. The kinetics parameters obtained are important for devising the growth strategy to make full oxygenated LBMO epitaxial films.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 3540-3542 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 74 |
| Issue number | 23 |
| DOIs | |
| State | Published - Jun 7 1999 |
All Science Journal Classification (ASJC) codes
- Physics and Astronomy (miscellaneous)
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