Keyphrases
Ferroelectric Properties
100%
Pulsed Laser
100%
PbTiO3 Thin Film
100%
SrRuO3
100%
Phase Development
100%
Laser Repetition Rate
50%
Heterostructure
50%
Electrical Properties
50%
Temperature Range
50%
PbTiO3
50%
LaAlO3
50%
Perovskite
50%
Pyrochlore
50%
Pulsed Laser Deposition
50%
Substrate Temperature
50%
Crystalline Properties
50%
Cubic Perovskite
50%
Saturation Polarization
50%
Chamber Pressure
50%
Pseudo-cubic
50%
Heteroepitaxial Structures
50%
Volatilization
50%
Typical Value
50%
Deposition Parameters
50%
Remanent
50%
Laser Frequency
50%
Target-substrate Distance
50%
O2 Pressure
50%
Engineering
Thin Films
100%
Development Phase
100%
Heterostructures
33%
Temperature Range
33%
Vaporization
33%
Chamber Pressure
33%
Substrate Temperature
33%
Deposition Parameter
33%
Repetition Rate
33%
Material Science
Thin Films
100%
Ferroelectricity
66%
Film
33%
Heterojunction
33%
Pulsed Laser Deposition
33%