Phase field simulation of charged interface formation during ferroelectric switching

Keyphrases

• Interface Formation 100%
• Phase-field Model 100%
• Ferroelectric Switching 100%
• Charged Interface 100%
• Ferroelastic Domains 66%
• Domain Walls 50%
• Epitaxial 33%
• Applied Bias 33%
• High-resolution Transmission Electron Microscopy (HRTEM) 16%
• Dislocation 16%
• Spatial Distribution 16%
• Grain Boundary 16%
• Ferroelectric Domain Walls 16%
• Ferroelectric Thin Film 16%
• Domain Wall Motion 16%
• Domain Structure 16%
• Applied Electric Field 16%
• Polarization Direction 16%
• Bound Charges 16%
• Ferroelastic Domain Structure 16%
• Defect Distribution 16%
• Local Processes 16%

Engineering

• Domain Wall 100%
• Phase Field 100%
• Thin Films 80%
• Domain Structure 40%
• High Resolution 20%
• Transmissions 20%
• Broadening 20%
• Defects 20%
• Spatial Distribution 20%
• Grain Boundary 20%
• Applied Electric Field 20%
• Polarization Direction 20%

Material Science

• Ferroelectric Material 100%
• Domain Wall 83%
• Thin Films 50%
• Film 16%
• Grain Boundary 16%
• High-Resolution Transmission Electron Microscopy 16%
• Ferroelectric Thin Films 16%