Photochemical properties of ultrathin TiO2 films prepared by chemical vapor deposition

Shinri Sato, A. Sobczynski, J. M. White, A. J. Bard, A. Campion, M. A. Fox, T. E. Mallouk, S. E. Webber

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18 Scopus citations


Thin films of TiO2 were prepared on fused silica and titanium substrates by chemical vapor deposition (CVD) using Ti[OCH(CH3)2]4 under conditions of anatase formation. The UV-visible transmission spectrum of the film deposited on the fused silica substrate showed an absorption edge 30 nm shorter than that of anatase powder. This blue shift may be attributed to size quantization, i.e. the film may consist of extremely small TiO2 particles. The absorption edge shifted to slightly longer wavelength upon heating the film in air at high temperatures. The photocatalytic property of the film was examined using the photodeposition reaction of silver from aqueous AgNO3. The silver photodeposition rate increased with the calcination temperature, maximizing at around 400°C and then decreasing at higher temperature. To compare the photocatalytic property with the photoelectrochemical property, photocurrents were measured in a KOH solution using the film deposited on the titanium substrate. They decreased after calcination at temperatures above 400°C. Compared to bulk TiO2, the wavelength dependence of the current was shifted to considerably shorter wavelengths, in agreement with the absorption spectrum.

Original languageEnglish (US)
Pages (from-to)283-290
Number of pages8
JournalJournal of Photochemistry and Photobiology, A: Chemistry
Issue number2
StatePublished - Dec 1989

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Chemical Engineering(all)
  • Physics and Astronomy(all)


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