Planar MgB 2 Josephson junctions and series arrays via nanolithography and ion damage

Shane A. Cybart; Ke Chen; Y. Cui; Qi Li; X. X. Xi; R. C. Dynes

doi:10.1063/1.2162669

Planar MgB ₂ Josephson junctions and series arrays via nanolithography and ion damage

Shane A. Cybart, Ke Chen, Y. Cui, Qi Li, X. X. Xi, R. C. Dynes

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45 Scopus citations

Abstract

We have fabricated planar thin-film MgB ₂ Josephson junctions and 20-junction series arrays using 200-keV ion implantation and electron-beam lithography. Resistively shunted junction I-V characteristics were observed in the temperature range of 34-38 K. The ac Josephson effect was observed and flat giant Shapiro steps in arrays suggest good junction uniformity with a small spread in junction parameters. The temperature dependence of the critical current suggests that the nature of the interface between the superconductor and normal region can be described using a soft boundary proximity effect coupling model. We believe that the higher operating temperature and close spacing of these junctions make them promising candidates for quantum voltage standards and other devices.

Original language	English (US)
Article number	012509
Journal	Applied Physics Letters
Volume	88
Issue number	1
DOIs	https://doi.org/10.1063/1.2162669
State	Published - 2006

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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10.1063/1.2162669

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@article{7f26778e8f7a456780cc1676196d71b0,

title = "Planar MgB 2 Josephson junctions and series arrays via nanolithography and ion damage",

abstract = "We have fabricated planar thin-film MgB 2 Josephson junctions and 20-junction series arrays using 200-keV ion implantation and electron-beam lithography. Resistively shunted junction I-V characteristics were observed in the temperature range of 34-38 K. The ac Josephson effect was observed and flat giant Shapiro steps in arrays suggest good junction uniformity with a small spread in junction parameters. The temperature dependence of the critical current suggests that the nature of the interface between the superconductor and normal region can be described using a soft boundary proximity effect coupling model. We believe that the higher operating temperature and close spacing of these junctions make them promising candidates for quantum voltage standards and other devices.",

author = "Cybart, {Shane A.} and Ke Chen and Y. Cui and Qi Li and Xi, {X. X.} and Dynes, {R. C.}",

note = "Funding Information: This work was supported by AFOSR Grant No. FA9550-04-1-0228, and the work at Penn State is supported in part by NSF under Grant Nos. DMR-0405502 (Q.L.), and DMR-0306746 (X.X.X.), and by ONR under Grant No. N00014-00-1-0294 (X.X.X.). The authors would like to thank Charles H. Y. Cheung for work on ion implantation simulations. Two of the authors (S. A. Cybart and K. Chen) made equal contributions to this work.",

year = "2006",

doi = "10.1063/1.2162669",

language = "English (US)",

volume = "88",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "1",

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TY - JOUR

T1 - Planar MgB 2 Josephson junctions and series arrays via nanolithography and ion damage

AU - Cybart, Shane A.

AU - Chen, Ke

AU - Cui, Y.

AU - Li, Qi

AU - Xi, X. X.

AU - Dynes, R. C.

N1 - Funding Information: This work was supported by AFOSR Grant No. FA9550-04-1-0228, and the work at Penn State is supported in part by NSF under Grant Nos. DMR-0405502 (Q.L.), and DMR-0306746 (X.X.X.), and by ONR under Grant No. N00014-00-1-0294 (X.X.X.). The authors would like to thank Charles H. Y. Cheung for work on ion implantation simulations. Two of the authors (S. A. Cybart and K. Chen) made equal contributions to this work.

PY - 2006

Y1 - 2006

N2 - We have fabricated planar thin-film MgB 2 Josephson junctions and 20-junction series arrays using 200-keV ion implantation and electron-beam lithography. Resistively shunted junction I-V characteristics were observed in the temperature range of 34-38 K. The ac Josephson effect was observed and flat giant Shapiro steps in arrays suggest good junction uniformity with a small spread in junction parameters. The temperature dependence of the critical current suggests that the nature of the interface between the superconductor and normal region can be described using a soft boundary proximity effect coupling model. We believe that the higher operating temperature and close spacing of these junctions make them promising candidates for quantum voltage standards and other devices.

AB - We have fabricated planar thin-film MgB 2 Josephson junctions and 20-junction series arrays using 200-keV ion implantation and electron-beam lithography. Resistively shunted junction I-V characteristics were observed in the temperature range of 34-38 K. The ac Josephson effect was observed and flat giant Shapiro steps in arrays suggest good junction uniformity with a small spread in junction parameters. The temperature dependence of the critical current suggests that the nature of the interface between the superconductor and normal region can be described using a soft boundary proximity effect coupling model. We believe that the higher operating temperature and close spacing of these junctions make them promising candidates for quantum voltage standards and other devices.

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DO - 10.1063/1.2162669

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JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 1

M1 - 012509

ER -

Planar MgB ₂ Josephson junctions and series arrays via nanolithography and ion damage

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