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Polysilyne resists for 193-nm excimer laser lithography

  • R. R. Kunz
  • , P. A. Bianconi
  • , M. W. Horn
  • , R. R. Paladugu
  • , D. C. Shaver
  • , D. A. Smith
  • , C. A. Freed

Research output: Contribution to journal › Conference article › peer-review

24   Link opens in a new tab Scopus citations

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