Polystyrene by XPS

Wayne K. Way; Scott W. Rosencrance; Nicholas Winograd; David A. Shirley

doi:10.1116/1.1247712

Polystyrene by XPS

Wayne K. Way, Scott W. Rosencrance, Nicholas Winograd, David A. Shirley

Research output: Contribution to journal › Article › peer-review

4 Scopus citations

Abstract

X-ray photoelectron spectroscopy was used to analyze a thin film of polystyrene. Spin casting from a 2% by weight solution of polystyrene in toluene was utilized. Film thickness was determined to be 60 nm by ellipsometry. The thin film was examined with a Hewlett Packard 5950A ESCA spectrometer.

Original language	English (US)
Pages (from-to)	67-70
Number of pages	4
Journal	Surface Science Spectra
Volume	2
Issue number	1
DOIs	https://doi.org/10.1116/1.1247712
State	Published - Jan 1 1993

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

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10.1116/1.1247712

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@article{96169bb2aabe4111aa14404927a5f0bb,

title = "Polystyrene by XPS",

abstract = "X-ray photoelectron spectroscopy was used to analyze a thin film of polystyrene. Spin casting from a 2% by weight solution of polystyrene in toluene was utilized. Film thickness was determined to be 60 nm by ellipsometry. The thin film was examined with a Hewlett Packard 5950A ESCA spectrometer.",

author = "Way, {Wayne K.} and Rosencrance, {Scott W.} and Nicholas Winograd and Shirley, {David A.}",

note = "Publisher Copyright: {\textcopyright} 1993 American Vacuum Society.",

year = "1993",

month = jan,

day = "1",

doi = "10.1116/1.1247712",

language = "English (US)",

volume = "2",

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journal = "Surface Science Spectra",

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publisher = "AVS Science and Technology Society",

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T1 - Polystyrene by XPS

AU - Way, Wayne K.

AU - Rosencrance, Scott W.

AU - Winograd, Nicholas

AU - Shirley, David A.

PY - 1993/1/1

Y1 - 1993/1/1

N2 - X-ray photoelectron spectroscopy was used to analyze a thin film of polystyrene. Spin casting from a 2% by weight solution of polystyrene in toluene was utilized. Film thickness was determined to be 60 nm by ellipsometry. The thin film was examined with a Hewlett Packard 5950A ESCA spectrometer.

AB - X-ray photoelectron spectroscopy was used to analyze a thin film of polystyrene. Spin casting from a 2% by weight solution of polystyrene in toluene was utilized. Film thickness was determined to be 60 nm by ellipsometry. The thin film was examined with a Hewlett Packard 5950A ESCA spectrometer.

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DO - 10.1116/1.1247712

M3 - Article

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JO - Surface Science Spectra

JF - Surface Science Spectra

IS - 1

ER -

Polystyrene by XPS

Abstract

All Science Journal Classification (ASJC) codes

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