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Preoxidation UV Treatment of Silicon Wafers
J. Ruzyllo
, A. M. Hoff
, G. T. Duranko
Materials Research Institute (MRI)
Research output
:
Contribution to journal
›
Article
›
peer-review
39
Scopus citations
Overview
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Dive into the research topics of 'Preoxidation UV Treatment of Silicon Wafers'. Together they form a unique fingerprint.
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Keyphrases
Pre-oxidation
100%
Gate Oxide
100%
Silicon Wafer
100%
UV Treatment
100%
Silicon Surface
66%
Water Vapor
33%
High Density
33%
Oxidation Mechanism
33%
Carbon Content
33%
Easy-to-implement
33%
Interface Traps
33%
Organic Removal
33%
Cleaning Methods
33%
Thermal Oxide
33%
Organic Contaminants
33%
Gate Oxidation
33%
Si-SiO2
33%
Thick Oxide
33%
Thermal Growth
33%
Dielectric Strength
33%
Wafer Cleaning
33%
Material Science
Oxide Compound
100%
Silicon Wafer
100%
Silicon
50%
Density
33%
Oxidation Reaction
33%
Surface (Surface Science)
33%
Electronic Circuit
16%
Water Vapor
16%
Dielectric Material
16%
Engineering
Gate Oxide
100%
Silicon Wafer
100%
Silicon Surface
66%
Dielectric Strength
33%
Silicon Dioxide
33%
Integrated Circuit
33%
Interface Trap
33%
Chemical Engineering
Organic Contaminant
100%