Preparation of lead zirconate titanate thin films by reactive magnetron co-sputtering

A reactive magnetron co-sputtering method with multiple metal targets was used to prepare lead zirconate titanate films, with Zr/Ti ratios of 85/15, 52/48 and 30/70. The lead content was also varied. Films deposited on platinum coated silicon substrates followed by rapid thermal annealing crystallized in the perovskite structure at 600°C and showed (100) preferred orientation. The effects of Pb content in the films and Zr/Ti ratio on structural and electrical properties were investigated. Ti rich PZT films showed larger polarizations and higher coercive fields. Films which were nearly fatigue-free up to 10 [9] fatigue cycles have been prepared. Monitoring the operating voltage, current and power of the Pb target, and oxygen control during deposition were found to be important in the preparation of high quality PZT films.