Process control and optimization methods for run-to-run application

Enrique Del Castillo, Arnon M. Hurwitz

Research output: Chapter in Book/Report/Conference proceedingChapter


In a typical semiconductor manufacturing process, within-run (or batch) variation is usually controlled by automatic controllers built into the equipment. Batch sizes may be as small as one wafer in some processes. A run-to-run (R2R) controller is necessary since specifications can change from batch to batch, the equipment may experience aging or wearing-out phenomena, maintenance operations can change the operating conditions of the process, or process disturbances may enter the system suddenly. This implies that equipment controllers cannot be kept operating at a fixed recipe. Thus, an R2R controller is needed to act as a supervisor, indicating whether a recipe change is needed and suggesting a new recipe for use in the next batch.

Original languageEnglish (US)
Title of host publicationRun-to-Run Control in Semiconductor Manufacturing
PublisherCRC Press
Number of pages19
ISBN (Electronic)9781420040661
ISBN (Print)0849311780, 9780849311789
StatePublished - Jan 1 2000

All Science Journal Classification (ASJC) codes

  • Engineering(all)


Dive into the research topics of 'Process control and optimization methods for run-to-run application'. Together they form a unique fingerprint.

Cite this