TY - GEN
T1 - Process monitoring and control of integrated-circuit manufacturing using Fourier transform infrared spectroscopy
AU - Liu, Shaohua
AU - Haigis, John R.
AU - DiTaranto, Marie B.
AU - Kinsella, Karen
AU - Markham, James R.
AU - Li, Qi
AU - Fenner, David B.
AU - Solomon, Peter R.
AU - Farquharson, Stuart
AU - Morrison, Philip W.
PY - 1995/1/1
Y1 - 1995/1/1
N2 - A computer algorithm, which matches theoretical to measured infrared reflectance spectra, was successfully employed to determine multiple thin film properties of integrated circuits. Properties, such as film thickness, dielectric constant, and free carrier concentration were determined for a variety of important electronic films both in the laboratory and in process reactors. The latter measurements were accomplished by optically interfacing a Fourier transform infrared (FT-IR) spectrometer to several reactors. Real-time process monitoring allowed determination of deposition rate, free carrier activation temperature, and the influence of reactor conditions on film properties. Finally, these measurements were nondestructive, performed in-situ and within seconds, demonstrating the utility of this method for real-time process monitoring and control.
AB - A computer algorithm, which matches theoretical to measured infrared reflectance spectra, was successfully employed to determine multiple thin film properties of integrated circuits. Properties, such as film thickness, dielectric constant, and free carrier concentration were determined for a variety of important electronic films both in the laboratory and in process reactors. The latter measurements were accomplished by optically interfacing a Fourier transform infrared (FT-IR) spectrometer to several reactors. Real-time process monitoring allowed determination of deposition rate, free carrier activation temperature, and the influence of reactor conditions on film properties. Finally, these measurements were nondestructive, performed in-situ and within seconds, demonstrating the utility of this method for real-time process monitoring and control.
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M3 - Conference contribution
AN - SCOPUS:0029238039
SN - 0819417130
T3 - Proceedings of SPIE - The International Society for Optical Engineering
SP - 171
EP - 182
BT - Proceedings of SPIE - The International Society for Optical Engineering
PB - Society of Photo-Optical Instrumentation Engineers
T2 - Optical Sensors for Environmental and Chemical Process Monitoring
Y2 - 9 November 1994 through 10 November 1994
ER -