Properties of MgB2 films grown at various temperatures by hybrid physical-chemical vapour deposition

Ke Chen; Menno Veldhorst; Che Hui Lee; Daniel R. Lamborn; Raymond Defrain; Joan M. Redwing; Qi Li; X. X. Xi

doi:10.1088/0953-2048/21/9/095015

Properties of MgB₂ films grown at various temperatures by hybrid physical-chemical vapour deposition

Ke Chen, Menno Veldhorst, Che Hui Lee, Daniel R. Lamborn, Raymond Defrain, Joan M. Redwing, Qi Li, X. X. Xi

Research output: Contribution to journal › Article › peer-review

9 Scopus citations

Abstract

A hybrid physical-chemical vapour deposition (HPCVD) system consisting of separately controlled Mg-source heater and substrate heater is used to grow MgB₂ thin films and thick films at various temperatures. We are able to grow superconducting MgB₂ thin films at temperatures as low as 350 °C with a T_c0 of 35.5K. MgB₂ films up to 4νm in thickness grown at 550 °C have J_c over 10⁶Acm ^-2 at 5K and zero applied field. The low deposition temperature of MgB₂ films is desirable for all-MgB₂ tunnel junctions and MgB₂ thick films are important for applications in coated conductors.

Original language	English (US)
Article number	095015
Journal	Superconductor Science and Technology
Volume	21
Issue number	9
DOIs	https://doi.org/10.1088/0953-2048/21/9/095015
State	Published - Sep 1 2008

All Science Journal Classification (ASJC) codes

Ceramics and Composites
Condensed Matter Physics
Metals and Alloys
Electrical and Electronic Engineering
Materials Chemistry

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10.1088/0953-2048/21/9/095015

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abstract = "A hybrid physical-chemical vapour deposition (HPCVD) system consisting of separately controlled Mg-source heater and substrate heater is used to grow MgB2 thin films and thick films at various temperatures. We are able to grow superconducting MgB2 thin films at temperatures as low as 350 °C with a Tc0 of 35.5K. MgB2 films up to 4νm in thickness grown at 550 °C have Jc over 106Acm -2 at 5K and zero applied field. The low deposition temperature of MgB2 films is desirable for all-MgB2 tunnel junctions and MgB2 thick films are important for applications in coated conductors.",

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AU - Chen, Ke

AU - Veldhorst, Menno

AU - Lee, Che Hui

AU - Lamborn, Daniel R.

AU - Defrain, Raymond

AU - Redwing, Joan M.

AU - Li, Qi

AU - Xi, X. X.

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AB - A hybrid physical-chemical vapour deposition (HPCVD) system consisting of separately controlled Mg-source heater and substrate heater is used to grow MgB2 thin films and thick films at various temperatures. We are able to grow superconducting MgB2 thin films at temperatures as low as 350 °C with a Tc0 of 35.5K. MgB2 films up to 4νm in thickness grown at 550 °C have Jc over 106Acm -2 at 5K and zero applied field. The low deposition temperature of MgB2 films is desirable for all-MgB2 tunnel junctions and MgB2 thick films are important for applications in coated conductors.

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Properties of MgB₂ films grown at various temperatures by hybrid physical-chemical vapour deposition

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