QUANTITATIVE SURFACE STUDIES WITH X-RAY PHOTOELECTRON SPECTROSCOPY (XPS) AND SECONDARY ION MASS SPECTROSCOPY (SIMS).

N. Winograd, A. Shepard, R. Hewitt, W. Baitinger, N. Delgass

Research output: Contribution to conferencePaperpeer-review

6 Scopus citations

Abstract

The combination of x-ray photoelectron spectroscopy with secondary ion mass spectroscopy promises to provide a powerful new approach both to quantitative analysis of surface composition and to the elucidation of surface molecular structure. The ultra high vacuum XPS/SIMS system was tested to characterize the In metal surface during exposure to oxygen. The emission of In** plus has been measured as a function of oxygen exposure concurrently with the O 1s intensity observed by XPS. A report is also given on the examination of clean In surfaces where ions of clusters of In//n** plus where n equals 1-4 is observed. Advantages of these combined techniques are outlined.

Original languageEnglish (US)
Pages2217-2220
Number of pages4
StatePublished - 1977
EventProc of the Int Vac Congr, 7th, and the Int Conf on Solid Surf, 3rd, of the Int Union for Vac Sci, Tech and Appl - Vienna, Austria
Duration: Sep 12 1977Sep 16 1977

Other

OtherProc of the Int Vac Congr, 7th, and the Int Conf on Solid Surf, 3rd, of the Int Union for Vac Sci, Tech and Appl
CityVienna, Austria
Period9/12/779/16/77

All Science Journal Classification (ASJC) codes

  • General Engineering

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