TY - JOUR
T1 - Quasi-Nondestructive Read Out of Ferroelectric Capacitor Polarization by Exploiting a 2TnC Cell to Relax the Endurance Requirement
AU - Xiao, Yi
AU - Deng, Shan
AU - Zhao, Zijian
AU - Faris, Zubair
AU - Xu, Yixin
AU - Huang, Tzu Jung
AU - Narayanan, Vijaykrishnan
AU - Ni, Kai
N1 - Publisher Copyright:
© 1980-2012 IEEE.
PY - 2023/9/1
Y1 - 2023/9/1
N2 - In this work, we exploit a 2TnC ferroelectric random access memory (FeRAM) cell design to realize the quasi-nondestructive readout (QNRO) of ferroelectric polarization ( PFE ) in a capacitor, which can relax the endurance requirement of the ferroelectric thin film and exploits the benefits of both FeRAM and ferroelectric FET (FeFET). We demonstrate that: i) QNRO sensing of PFE is conducted successfully in experiment with a ON/OFF ratio ( ION / IOFF ) > 103, ION > 10~μ A , and read endurance > 106 cycles, which can relax the FeRAM endurance requirement by 10 ^\mathrm 6x ; ii) optimization of the cell performance can be realized by tuning the metal-ferroelectric-metal capacitor (MFM) capacitor to read transistor area ratio and read transistor threshold voltage ( VTH ); iii) the 2TnC cell structure is 3D-compatible, enabling integration of highly dense memory solution; iv) the 2TnC cell structure also enables compute-in-memory (CIM) applications of FeRAM, which has not been widely explored. With this technology, storage and memory-centric computing can be enabled.
AB - In this work, we exploit a 2TnC ferroelectric random access memory (FeRAM) cell design to realize the quasi-nondestructive readout (QNRO) of ferroelectric polarization ( PFE ) in a capacitor, which can relax the endurance requirement of the ferroelectric thin film and exploits the benefits of both FeRAM and ferroelectric FET (FeFET). We demonstrate that: i) QNRO sensing of PFE is conducted successfully in experiment with a ON/OFF ratio ( ION / IOFF ) > 103, ION > 10~μ A , and read endurance > 106 cycles, which can relax the FeRAM endurance requirement by 10 ^\mathrm 6x ; ii) optimization of the cell performance can be realized by tuning the metal-ferroelectric-metal capacitor (MFM) capacitor to read transistor area ratio and read transistor threshold voltage ( VTH ); iii) the 2TnC cell structure is 3D-compatible, enabling integration of highly dense memory solution; iv) the 2TnC cell structure also enables compute-in-memory (CIM) applications of FeRAM, which has not been widely explored. With this technology, storage and memory-centric computing can be enabled.
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U2 - 10.1109/LED.2023.3290940
DO - 10.1109/LED.2023.3290940
M3 - Article
AN - SCOPUS:85163437996
SN - 0741-3106
VL - 44
SP - 1436
EP - 1439
JO - IEEE Electron Device Letters
JF - IEEE Electron Device Letters
IS - 9
ER -