Abstract
Silicon nanostructure arrays were synthesized via Ag-catalysed chemical etching on solar cells. In contrast to the traditional etching in HF/AgNO 3, the new technique used in this work produced nanostructure textures located only on the front surface of the cells. Furthermore, a SiO 2/SiNX bi-layer was used to passivate the surface of the cells. By these optimizations, nanostructure-textured cells' performance was improved. The data obtained from this work are fundamental and has some reference value for future studies.
Original language | English (US) |
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Article number | 025101 |
Journal | Journal of Physics D: Applied Physics |
Volume | 46 |
Issue number | 2 |
DOIs | |
State | Published - Jan 16 2013 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Acoustics and Ultrasonics
- Surfaces, Coatings and Films