Rigorous electromagnetic modeling of near-field phase-shifting contact lithography

Physics & Astronomy

• photoresists 83%
• near fields 67%
• lithography 65%
• electromagnetism 56%
• masks 33%
• high aspect ratio 21%
• electromagnetic absorption 20%
• printing 19%
• quartz 17%
• phase shift 16%
• plane waves 16%
• illumination 14%
• profiles 10%
• silicon 10%
• polarization 10%

Engineering & Materials Science

• Photoresists 100%
• Lithography 85%
• Masks 37%
• Electromagnetic wave absorption 32%
• Quartz 21%
• Phase shift 21%
• Printing 18%
• Aspect ratio 18%
• Polarization 17%
• Lighting 15%
• Silicon 15%
• Substrates 13%

Chemical Compounds

• Plane Wave 52%
• Illumination 35%
• Quartz 34%
• Dimension 29%
• Polarization 29%