Abstract
Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine “runs,” thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry’s widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.
Original language | English (US) |
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Publisher | CRC Press |
Number of pages | 348 |
ISBN (Electronic) | 9781420040661 |
ISBN (Print) | 0849311780, 9780849311789 |
State | Published - Jan 1 2000 |
All Science Journal Classification (ASJC) codes
- Engineering(all)