TY - BOOK
T1 - Run-to-run control in semiconductor manufacturing
AU - Moyne, James
AU - Del Castillo, Enrique
AU - Hurwitz, Arnon Max
N1 - Publisher Copyright:
© 2001 by CRC Press LLC.
PY - 2000/1/1
Y1 - 2000/1/1
N2 - Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine “runs,” thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry’s widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.
AB - Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine “runs,” thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry’s widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.
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M3 - Book
AN - SCOPUS:85056978251
SN - 0849311780
SN - 9780849311789
BT - Run-to-run control in semiconductor manufacturing
PB - CRC Press
ER -