Abstract
We report a novel technique by which self-aligned thin-film electrodes are fabricated on SU-8 negative photoresist pedestals. A bilayer aluminum and titanium structure is used to align the thin-film electrode and to serve as the optical mask for the UV exposure of the SU-8. The SU-8 developer is used to remove both the unexposed SU-8 and the bilayer structure of aluminum and titanium. The result is a thin-film electrode aligned on an SU-8 pedestal with a minimal undercut beneath the thin-film electrode.
Original language | English (US) |
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Article number | 6784311 |
Pages (from-to) | 508-510 |
Number of pages | 3 |
Journal | Journal of Microelectromechanical Systems |
Volume | 23 |
Issue number | 3 |
DOIs | |
State | Published - Jun 2014 |
All Science Journal Classification (ASJC) codes
- Mechanical Engineering
- Electrical and Electronic Engineering