@inproceedings{67e9db455f5c49b69737e51992d28740,
title = "Semiconductor surface cleaning and conditioning challenges beyond planar silicon technology",
abstract = "The paper reviews the challenges semiconductor cleaning technology is facing in the light of: (i) advanced silicon technology moving in the direction of non-planar device structures such as 3D MOS gates, MEMS devices as well ID nanowire-type structures, (ii) the need for modified cleans for semiconductors other than silicon, e.g. Ge and III-V compounds, and (iii) emerging needs to process surfaces of non-semiconductor substrates such as for instance sapphire in SOS (Silicon-On-Sapphire) material systems. It is concluded that in several areas significant modifications of the established cleaning technology are needed to meet emerging challenges.",
author = "Jerzy Ruzyllo",
year = "2007",
doi = "10.1149/1.2766877",
language = "English (US)",
isbn = "9781566775656",
series = "ECS Transactions",
number = "1",
pages = "87--95",
booktitle = "ECS Transactions - 22nd Symposium on Microelectronics Technology and Devices, SBMicro2007",
edition = "1",
note = "22nd Symposium on Microelectronics Technology and Devices, SBMicro2007 ; Conference date: 03-09-2007 Through 06-09-2007",
}