Single Crystalline ScAlN Surface Acoustic Wave Resonators with Large Figure of Merit (Q × k)

Zhijian Hao, Mingyo Park, Dea Gyu Kim, Andrew Clark, Rytis Dargis, Haoshen Zhu, Azadeh Ansari

Research output: Chapter in Book/Report/Conference proceedingConference contribution

38 Scopus citations

Abstract

Surface acoustic wave (SAW) resonators based on single crystalline aluminum nitride (AlN) and scandium aluminum nitride (ScAlN) grown by molecular beam epitaxy (MBE) demonstrated substantial improvement in acoustic performance compared to the state-of-art devices with sputtered piezoelectric layers on silicon substrates. High coupling coefficient \left( {k-t^2} \right) up to 5.0% and 7.8% were found in resonators with AlN and ScAlN device layers, respectively, due to better crystallinity and scandium doping. This resulted in high figure of merits \left( {Q \times k-t^2} \right) among SAW devices on silicon up to 5.4, which is about twice larger than the previous work using sputtered ScAlN on silicon and comparable to those on non-silicon substrates.

Original languageEnglish (US)
Title of host publication2019 IEEE MTT-S International Microwave Symposium, IMS 2019
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages786-789
Number of pages4
ISBN (Electronic)9781728113098
DOIs
StatePublished - Jun 2019
Event2019 IEEE MTT-S International Microwave Symposium, IMS 2019 - Boston, United States
Duration: Jun 2 2019Jun 7 2019

Publication series

NameIEEE MTT-S International Microwave Symposium Digest
ISSN (Print)0149-645X

Conference

Conference2019 IEEE MTT-S International Microwave Symposium, IMS 2019
Country/TerritoryUnited States
CityBoston
Period6/2/196/7/19

All Science Journal Classification (ASJC) codes

  • Radiation
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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