Spatial light modulator for maskless optical projection lithography

G. P. Watson; V. Aksyuk; M. E. Simon; D. M. Tennant; R. A. Cirelli; W. M. Mansfield; F. Pardo; D. O. Lopez; C. A. Bolle; A. R. Papazian; N. Basavanhally; J. Lee; R. Fullowan; F. Klemens; J. Miner; A. Kornblit; T. Sorsch; L. Fetter; M. Peabody; J. E. Bower; J. S. Weiner; Y. L. Low

doi:10.1116/1.2387156

Spatial light modulator for maskless optical projection lithography

G. P. Watson, V. Aksyuk, M. E. Simon, D. M. Tennant, R. A. Cirelli, W. M. Mansfield, F. Pardo, D. O. Lopez, C. A. Bolle, A. R. Papazian, N. Basavanhally, J. Lee, R. Fullowan, F. Klemens, J. Miner, A. Kornblit, T. Sorsch, L. Fetter, M. Peabody, J. E. BowerJ. S. Weiner, Y. L. Low

Electrical Engineering

Research output: Contribution to journal › Article › peer-review

24 Scopus citations

Abstract

Spatial light modulators (SLMs) designed to replace photomasks for optical lithography have been designed, fabricated, and tested. These microelectromechanical devices are fabricated with alternating polycrystalline Si and sacrificial Si O2 layers that are patterned by a 193 nm wavelength scanner to dimensions as small as 150 nm. Aerial image simulations were used to define the mechanical requirements of the devices. Piston motion of electrically actuated devices was measured with an optical profilometer. The measurements were fit to a simple equation to within 1 nm precision, which is adequate for defining 50 nm features lithographically. Transient response measurements show that one version of the SLM responds to actuation as quickly as 20 μs, fast enough for current 193 nm wavelength excimer laser sources.

Original language	English (US)
Pages (from-to)	2852-2856
Number of pages	5
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	24
Issue number	6
DOIs	https://doi.org/10.1116/1.2387156
State	Published - 2006

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Electrical and Electronic Engineering

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10.1116/1.2387156

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Watson, G. P., Aksyuk, V., Simon, M. E., Tennant, D. M., Cirelli, R. A., Mansfield, W. M., Pardo, F., Lopez, D. O., Bolle, C. A., Papazian, A. R., Basavanhally, N., Lee, J., Fullowan, R., Klemens, F., Miner, J., Kornblit, A., Sorsch, T., Fetter, L., Peabody, M., ... Low, Y. L. (2006). Spatial light modulator for maskless optical projection lithography. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 24(6), 2852-2856. https://doi.org/10.1116/1.2387156

@article{764fcb8f7fea4945bd3840ed7195b1b3,

title = "Spatial light modulator for maskless optical projection lithography",

abstract = "Spatial light modulators (SLMs) designed to replace photomasks for optical lithography have been designed, fabricated, and tested. These microelectromechanical devices are fabricated with alternating polycrystalline Si and sacrificial Si O2 layers that are patterned by a 193 nm wavelength scanner to dimensions as small as 150 nm. Aerial image simulations were used to define the mechanical requirements of the devices. Piston motion of electrically actuated devices was measured with an optical profilometer. The measurements were fit to a simple equation to within 1 nm precision, which is adequate for defining 50 nm features lithographically. Transient response measurements show that one version of the SLM responds to actuation as quickly as 20 μs, fast enough for current 193 nm wavelength excimer laser sources.",

author = "Watson, {G. P.} and V. Aksyuk and Simon, {M. E.} and Tennant, {D. M.} and Cirelli, {R. A.} and Mansfield, {W. M.} and F. Pardo and Lopez, {D. O.} and Bolle, {C. A.} and Papazian, {A. R.} and N. Basavanhally and J. Lee and R. Fullowan and F. Klemens and J. Miner and A. Kornblit and T. Sorsch and L. Fetter and M. Peabody and Bower, {J. E.} and Weiner, {J. S.} and Low, {Y. L.}",

note = "Funding Information: Thanks to Roland Ryf for helpful discussions concerning transient response measurements. This material is based upon work supported by DARPA under SSC San Diego Contract No. N66001-04-C-8028. ",

year = "2006",

doi = "10.1116/1.2387156",

language = "English (US)",

volume = "24",

pages = "2852--2856",

journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

number = "6",

}

Watson, GP, Aksyuk, V, Simon, ME, Tennant, DM, Cirelli, RA, Mansfield, WM, Pardo, F, Lopez, DO, Bolle, CA, Papazian, AR, Basavanhally, N, Lee, J, Fullowan, R, Klemens, F, Miner, J, Kornblit, A, Sorsch, T, Fetter, L, Peabody, M, Bower, JE, Weiner, JS & Low, YL 2006, 'Spatial light modulator for maskless optical projection lithography', Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 24, no. 6, pp. 2852-2856. https://doi.org/10.1116/1.2387156

TY - JOUR

T1 - Spatial light modulator for maskless optical projection lithography

AU - Watson, G. P.

AU - Aksyuk, V.

AU - Simon, M. E.

AU - Tennant, D. M.

AU - Cirelli, R. A.

AU - Mansfield, W. M.

AU - Pardo, F.

AU - Lopez, D. O.

AU - Bolle, C. A.

AU - Papazian, A. R.

AU - Basavanhally, N.

AU - Lee, J.

AU - Fullowan, R.

AU - Klemens, F.

AU - Miner, J.

AU - Kornblit, A.

AU - Sorsch, T.

AU - Fetter, L.

AU - Peabody, M.

AU - Bower, J. E.

AU - Weiner, J. S.

AU - Low, Y. L.

N1 - Funding Information: Thanks to Roland Ryf for helpful discussions concerning transient response measurements. This material is based upon work supported by DARPA under SSC San Diego Contract No. N66001-04-C-8028.

PY - 2006

Y1 - 2006

N2 - Spatial light modulators (SLMs) designed to replace photomasks for optical lithography have been designed, fabricated, and tested. These microelectromechanical devices are fabricated with alternating polycrystalline Si and sacrificial Si O2 layers that are patterned by a 193 nm wavelength scanner to dimensions as small as 150 nm. Aerial image simulations were used to define the mechanical requirements of the devices. Piston motion of electrically actuated devices was measured with an optical profilometer. The measurements were fit to a simple equation to within 1 nm precision, which is adequate for defining 50 nm features lithographically. Transient response measurements show that one version of the SLM responds to actuation as quickly as 20 μs, fast enough for current 193 nm wavelength excimer laser sources.

AB - Spatial light modulators (SLMs) designed to replace photomasks for optical lithography have been designed, fabricated, and tested. These microelectromechanical devices are fabricated with alternating polycrystalline Si and sacrificial Si O2 layers that are patterned by a 193 nm wavelength scanner to dimensions as small as 150 nm. Aerial image simulations were used to define the mechanical requirements of the devices. Piston motion of electrically actuated devices was measured with an optical profilometer. The measurements were fit to a simple equation to within 1 nm precision, which is adequate for defining 50 nm features lithographically. Transient response measurements show that one version of the SLM responds to actuation as quickly as 20 μs, fast enough for current 193 nm wavelength excimer laser sources.

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JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 6

ER -

Spatial light modulator for maskless optical projection lithography

Abstract

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