TY - JOUR
T1 - Static SIMS study of the behavior of K atoms on -CH 3 , -CO 2 H and -CO 2 CH 3 terminated self-assembled monolayers
AU - Zhu, Z.
AU - Haynie, B. C.
AU - Winograd, N.
N1 - Funding Information:
The authors acknowledge NSF for partial financial support of this work. The assistance of David Allara and his research group in suggesting experiments and in providing many of the SAMs is greatly appreciated.
PY - 2004/6/15
Y1 - 2004/6/15
N2 - Time-of-flight secondary ion mass spectroscopy has proven to be a very powerful tool in the study of the interaction of metal atoms with organic thin films since analysis of the emitted molecular cluster ions provide clear information about the presence of chemical reactions, metal penetration and metal nucleation. In this work, this approach is employed to examine the behavior of K atoms evaporated onto -S(CH 2 ) 15 CH 3 , -S(CH 2 ) 15 CO 2 H and -S(CH 2 ) 15 CO 2 CH 3 self-assembled monolayers on Au substrates. On the -CH 3 surface, no chemical reaction is observed, and the sticking probability of K atoms is quite low. However, we find that K atoms react with -CO 2 H and -CO 2 CH 3 groups, forming -CO 2 K moieties at the vacuum interface, but do not react with the -(CH 2 ) n - backbone. Additional exposure of K to the system results in K remaining at the vacuum interface, not penetrating through the organic layer. The results imply that the CO 2 K may act as a possible buffer layer to prevent chemical reactions when other types of metal atoms are employed.
AB - Time-of-flight secondary ion mass spectroscopy has proven to be a very powerful tool in the study of the interaction of metal atoms with organic thin films since analysis of the emitted molecular cluster ions provide clear information about the presence of chemical reactions, metal penetration and metal nucleation. In this work, this approach is employed to examine the behavior of K atoms evaporated onto -S(CH 2 ) 15 CH 3 , -S(CH 2 ) 15 CO 2 H and -S(CH 2 ) 15 CO 2 CH 3 self-assembled monolayers on Au substrates. On the -CH 3 surface, no chemical reaction is observed, and the sticking probability of K atoms is quite low. However, we find that K atoms react with -CO 2 H and -CO 2 CH 3 groups, forming -CO 2 K moieties at the vacuum interface, but do not react with the -(CH 2 ) n - backbone. Additional exposure of K to the system results in K remaining at the vacuum interface, not penetrating through the organic layer. The results imply that the CO 2 K may act as a possible buffer layer to prevent chemical reactions when other types of metal atoms are employed.
UR - http://www.scopus.com/inward/record.url?scp=2942594066&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=2942594066&partnerID=8YFLogxK
U2 - 10.1016/j.apsusc.2004.03.075
DO - 10.1016/j.apsusc.2004.03.075
M3 - Article
AN - SCOPUS:2942594066
SN - 0169-4332
VL - 231-232
SP - 318
EP - 322
JO - Applied Surface Science
JF - Applied Surface Science
ER -