Static SIMS study of the behavior of K atoms on -CH 3 , -CO 2 H and -CO 2 CH 3 terminated self-assembled monolayers

Z. Zhu, B. C. Haynie, N. Winograd

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10 Scopus citations


Time-of-flight secondary ion mass spectroscopy has proven to be a very powerful tool in the study of the interaction of metal atoms with organic thin films since analysis of the emitted molecular cluster ions provide clear information about the presence of chemical reactions, metal penetration and metal nucleation. In this work, this approach is employed to examine the behavior of K atoms evaporated onto -S(CH 2 ) 15 CH 3 , -S(CH 2 ) 15 CO 2 H and -S(CH 2 ) 15 CO 2 CH 3 self-assembled monolayers on Au substrates. On the -CH 3 surface, no chemical reaction is observed, and the sticking probability of K atoms is quite low. However, we find that K atoms react with -CO 2 H and -CO 2 CH 3 groups, forming -CO 2 K moieties at the vacuum interface, but do not react with the -(CH 2 ) n - backbone. Additional exposure of K to the system results in K remaining at the vacuum interface, not penetrating through the organic layer. The results imply that the CO 2 K may act as a possible buffer layer to prevent chemical reactions when other types of metal atoms are employed.

Original languageEnglish (US)
Pages (from-to)318-322
Number of pages5
JournalApplied Surface Science
StatePublished - Jun 15 2004

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films


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