Step-and-grow approach for precisely positioned nanowire array structure fabrication

W. J. Nam; P. Park; S. Joshi; H. Carrion; P. Garg; S. J. Fonash

doi:10.1115/MSEC2007-31151

Step-and-grow approach for precisely positioned nanowire array structure fabrication

W. J. Nam, P. Park, S. Joshi, H. Carrion, P. Garg, S. J. Fonash

Marcus Department of Industrial and Manufacturing Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

A novel fabrication approach for forming precisely positioned nanowire array structures is introduced. The approach is suitable for potentially economical and environmentally safe manufacturing. For the demonstration of this approach, 100nm wide Sn nanowires and 150nm wide polyaniline (PANI) nanowires were synthesized using an electro-chemical deposition technique and a process we term the step-and-grow method. The nanowires produced exhibit the expected properties. For example, synthesized PANI nanowires showed reasonable ranges of electrical conductivities (e.g., 25S/cm for a 200nm wide, 200nm high, 10um long nanowire), and formed ohmic contact with electrodes on a substrate. It is shown that the polydimethylsiloxane (PDMS) stepping template mold used for our step-and-grow nanowire synthesis process can be used at least up to 40 times without degradation.

Original language	English (US)
Title of host publication	American Society of Mechanical Engineers
Pages	653-657
Number of pages	5
DOIs	https://doi.org/10.1115/MSEC2007-31151
State	Published - 2007
Event	2007 ASME International Conference on Manufacturing Science and Engineering - Atlanta, GA, United States Duration: Jan 15 2007 → Oct 18 2007

Publication series

Name	Proceedings of the ASME International Manufacturing Science and Engineering Conference 2007, MSEC2007

Other

Other	2007 ASME International Conference on Manufacturing Science and Engineering
Country/Territory	United States
City	Atlanta, GA
Period	1/15/07 → 10/18/07

All Science Journal Classification (ASJC) codes

Industrial and Manufacturing Engineering

Access to Document

10.1115/MSEC2007-31151

Cite this

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title = "Step-and-grow approach for precisely positioned nanowire array structure fabrication",

abstract = "A novel fabrication approach for forming precisely positioned nanowire array structures is introduced. The approach is suitable for potentially economical and environmentally safe manufacturing. For the demonstration of this approach, 100nm wide Sn nanowires and 150nm wide polyaniline (PANI) nanowires were synthesized using an electro-chemical deposition technique and a process we term the step-and-grow method. The nanowires produced exhibit the expected properties. For example, synthesized PANI nanowires showed reasonable ranges of electrical conductivities (e.g., 25S/cm for a 200nm wide, 200nm high, 10um long nanowire), and formed ohmic contact with electrodes on a substrate. It is shown that the polydimethylsiloxane (PDMS) stepping template mold used for our step-and-grow nanowire synthesis process can be used at least up to 40 times without degradation.",

author = "Nam, {W. J.} and P. Park and S. Joshi and H. Carrion and P. Garg and Fonash, {S. J.}",

year = "2007",

doi = "10.1115/MSEC2007-31151",

language = "English (US)",

isbn = "0791842908",

series = "Proceedings of the ASME International Manufacturing Science and Engineering Conference 2007, MSEC2007",

pages = "653--657",

booktitle = "American Society of Mechanical Engineers",

note = "2007 ASME International Conference on Manufacturing Science and Engineering ; Conference date: 15-01-2007 Through 18-10-2007",

}

Nam, WJ, Park, P, Joshi, S, Carrion, H, Garg, P & Fonash, SJ 2007, Step-and-grow approach for precisely positioned nanowire array structure fabrication. in American Society of Mechanical Engineers. Proceedings of the ASME International Manufacturing Science and Engineering Conference 2007, MSEC2007, pp. 653-657, 2007 ASME International Conference on Manufacturing Science and Engineering, Atlanta, GA, United States, 1/15/07. https://doi.org/10.1115/MSEC2007-31151

Step-and-grow approach for precisely positioned nanowire array structure fabrication. / Nam, W. J.; Park, P.; Joshi, S. et al.
American Society of Mechanical Engineers. 2007. p. 653-657 (Proceedings of the ASME International Manufacturing Science and Engineering Conference 2007, MSEC2007).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - Step-and-grow approach for precisely positioned nanowire array structure fabrication

AU - Nam, W. J.

AU - Park, P.

AU - Joshi, S.

AU - Carrion, H.

AU - Garg, P.

AU - Fonash, S. J.

PY - 2007

Y1 - 2007

N2 - A novel fabrication approach for forming precisely positioned nanowire array structures is introduced. The approach is suitable for potentially economical and environmentally safe manufacturing. For the demonstration of this approach, 100nm wide Sn nanowires and 150nm wide polyaniline (PANI) nanowires were synthesized using an electro-chemical deposition technique and a process we term the step-and-grow method. The nanowires produced exhibit the expected properties. For example, synthesized PANI nanowires showed reasonable ranges of electrical conductivities (e.g., 25S/cm for a 200nm wide, 200nm high, 10um long nanowire), and formed ohmic contact with electrodes on a substrate. It is shown that the polydimethylsiloxane (PDMS) stepping template mold used for our step-and-grow nanowire synthesis process can be used at least up to 40 times without degradation.

AB - A novel fabrication approach for forming precisely positioned nanowire array structures is introduced. The approach is suitable for potentially economical and environmentally safe manufacturing. For the demonstration of this approach, 100nm wide Sn nanowires and 150nm wide polyaniline (PANI) nanowires were synthesized using an electro-chemical deposition technique and a process we term the step-and-grow method. The nanowires produced exhibit the expected properties. For example, synthesized PANI nanowires showed reasonable ranges of electrical conductivities (e.g., 25S/cm for a 200nm wide, 200nm high, 10um long nanowire), and formed ohmic contact with electrodes on a substrate. It is shown that the polydimethylsiloxane (PDMS) stepping template mold used for our step-and-grow nanowire synthesis process can be used at least up to 40 times without degradation.

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T3 - Proceedings of the ASME International Manufacturing Science and Engineering Conference 2007, MSEC2007

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BT - American Society of Mechanical Engineers

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ER -

Step-and-grow approach for precisely positioned nanowire array structure fabrication

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