Keyphrases
Deposition Rate
25%
Dielectric
100%
Dielectric Constant
25%
Equivalent Oxide Thickness
25%
Gate Stack
25%
Hafnium
25%
HfO2
25%
Leakage Current
25%
Material Properties
25%
Metal Oxide Semiconductor
100%
O Phase
25%
Physical Thickness
25%
Semiconductor Applications
100%
Ultrathin
25%
X-ray Diffractometry
25%
X-ray Photoelectron Spectroscopy
25%
Material Science
Film
100%
Hafnium
50%
Materials Property
50%
Metal Oxide
100%
Oxide Compound
50%
Oxide Semiconductor
100%
Permittivity
50%
X Ray Diffraction Analysis
50%
X-Ray Photoelectron Spectroscopy
50%
Engineering
Deposited Film
33%
Deposition Rate
33%
Dielectrics
100%
Gate Stack
33%
Metal Oxide Semiconductor
100%
Oxide Thickness
33%
Ray Photoelectron Spectroscopy
33%