Studies of mist deposition for the formation of quantum dot CdSe films

S. C. Price, K. Shanmugasundaram, S. Ramani, T. Zhu, F. Zhang, J. Xu, S. E. Mohney, Q. Zhang, A. Kshirsagar, J. Ruzyllo

Research output: Contribution to journalArticlepeer-review

8 Scopus citations


Films of CdSe(ZnS) colloidal nanocrystalline quantum dots (NQDs) were deposited on bare silicon, glass and polymer coated silicon using mist deposition. This effort is a part of an exploratory investigation in which this deposition technique is studied for the first time as a method to form semiconductor NQD films. The process parameters, including deposition time, solution concentration and electric field, were varied to change the thickness of the deposited film. Blanket films and films deposited through a shadow mask were created to investigate the method's ability to pattern films during the deposition process. The differences between these deposition modes in terms of film morphology were observed. Overall, the results show that mist deposition of quantum dots is a viable method for creating thin, patterned quantum dot films using colloidal solution as the precursor. It is concluded that this technique shows very good promise for quantum dot (light emitting diode, LED) fabrication.

Original languageEnglish (US)
Article number105024
JournalSemiconductor Science and Technology
Issue number10
StatePublished - 2009

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry


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