TY - JOUR
T1 - Study on growth kinetics of CdSe nanocrystals with a new model
AU - Su, Huaipeng
AU - Dixon, John David
AU - Wang, Andrew Y.
AU - Low, Jeremy
AU - Xu, Jian
AU - Wang, Jingkang
PY - 2010/5
Y1 - 2010/5
N2 - A model which involves both bulk diffusion process and surface reaction process has been developed for describing the growth behaviour of nanoparticles. When the model is employed, hypothesising that either of the processes alone dominates the overall growth process is unnecessary. Conversely, the relative magnitude of contributions from both processes could be obtained from the model. Using this model in our system, the growth process of CdSe QDs demonstrated two different growth stages. During the first stage, the growth of CdSe QDs was dominated by bulk diffusion, whereas, neither the bulk diffusion process nor the surface reaction process could be neglected during the later stage. At last, we successfully modelled the Ostwald ripening of CdSe QDs with LSW theories.
AB - A model which involves both bulk diffusion process and surface reaction process has been developed for describing the growth behaviour of nanoparticles. When the model is employed, hypothesising that either of the processes alone dominates the overall growth process is unnecessary. Conversely, the relative magnitude of contributions from both processes could be obtained from the model. Using this model in our system, the growth process of CdSe QDs demonstrated two different growth stages. During the first stage, the growth of CdSe QDs was dominated by bulk diffusion, whereas, neither the bulk diffusion process nor the surface reaction process could be neglected during the later stage. At last, we successfully modelled the Ostwald ripening of CdSe QDs with LSW theories.
UR - http://www.scopus.com/inward/record.url?scp=77952095398&partnerID=8YFLogxK
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U2 - 10.1007/s11671-010-9568-3
DO - 10.1007/s11671-010-9568-3
M3 - Article
C2 - 20672112
AN - SCOPUS:77952095398
SN - 1931-7573
VL - 5
SP - 823
EP - 828
JO - Nanoscale Research Letters
JF - Nanoscale Research Letters
IS - 5
ER -