Sub-100 nm patterning of supported bilayers by nanoshaving lithography

Jinjun Shi, Jixin Chen, Paul S. Cremer

Research output: Contribution to journalArticlepeer-review

82 Scopus citations


Sub-100 nm wide supported phospholipid bilayers (SLBs) were patterned on a planar borosilicate substrate by AFM-based nanoshaving lithography. First, a bovine serum albumin monolayer was coated on the glass and then selectively removed in long strips by an AFM tip. The width of vacant strips could be controlled down to 15 nm. Bilayer lines could be formed within the vacant strips by vesicle fusion. It was found that stable bilayers formed by this method had a lower size limit of ∼ 55 nm in width. This size limit stems from a balance between a favorable bilayer adhesion energy and an unfavorable bilayer edge energy.

Original languageEnglish (US)
Pages (from-to)2718-2719
Number of pages2
JournalJournal of the American Chemical Society
Issue number9
StatePublished - Mar 5 2008

All Science Journal Classification (ASJC) codes

  • Catalysis
  • General Chemistry
  • Biochemistry
  • Colloid and Surface Chemistry


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