@article{613ed6cd32e247daa389f777fcf50d82,
title = "Sub-150 nm, high-aspect-ratio features using near-field phase-shifting contact lithography",
author = "Hai Dang and Tan, {Jackie Lim Piu} and Horn, {Mark W.}",
year = "2003",
doi = "10.1116/1.1577126",
language = "English (US)",
volume = "21",
pages = "1143--1148",
journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",
issn = "1071-1023",
publisher = "AVS Science and Technology Society",
number = "3",
}