Sub- 30-nm patterning on quartz for imprint lithography templates

Charan Srinivasan; J. Nathan Hohman; Mary E. Anderson; Paul S. Weiss; Mark W. Horn

doi:10.1063/1.2963982

Sub- 30-nm patterning on quartz for imprint lithography templates

Charan Srinivasan, J. Nathan Hohman, Mary E. Anderson, Paul S. Weiss, Mark W. Horn

Research output: Contribution to journal › Article › peer-review

14 Scopus citations

Abstract

A parallel and economical method for obtaining nanoscale features on large-area quartz substrates has been developed for use in nanoimprint lithography template fabrication. Self-assembled multilayer films (molecular rulers) are used in conjunction with photolithographically defined metallic features to generate precise nanogaps with sub- 30-nm resolution on quartz substrates. These nanopatterns are then transferred to the quartz substrates using the metallic thin films as etch masks.

Original language	English (US)
Article number	083123
Journal	Applied Physics Letters
Volume	93
Issue number	8
DOIs	https://doi.org/10.1063/1.2963982
State	Published - 2008

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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10.1063/1.2963982

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title = "Sub- 30-nm patterning on quartz for imprint lithography templates",

abstract = "A parallel and economical method for obtaining nanoscale features on large-area quartz substrates has been developed for use in nanoimprint lithography template fabrication. Self-assembled multilayer films (molecular rulers) are used in conjunction with photolithographically defined metallic features to generate precise nanogaps with sub- 30-nm resolution on quartz substrates. These nanopatterns are then transferred to the quartz substrates using the metallic thin films as etch masks.",

author = "Charan Srinivasan and Hohman, {J. Nathan} and Anderson, {Mary E.} and Weiss, {Paul S.} and Horn, {Mark W.}",

note = "Funding Information: This research was funded by NSF MRSEC and conducted in part at the Penn State NNIN node. The authors thank the Penn State Nanofabrication Center staff for helpful interactions. ",

year = "2008",

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language = "English (US)",

volume = "93",

journal = "Applied Physics Letters",

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T1 - Sub- 30-nm patterning on quartz for imprint lithography templates

AU - Srinivasan, Charan

AU - Hohman, J. Nathan

AU - Anderson, Mary E.

AU - Weiss, Paul S.

AU - Horn, Mark W.

N1 - Funding Information: This research was funded by NSF MRSEC and conducted in part at the Penn State NNIN node. The authors thank the Penn State Nanofabrication Center staff for helpful interactions.

PY - 2008

Y1 - 2008

N2 - A parallel and economical method for obtaining nanoscale features on large-area quartz substrates has been developed for use in nanoimprint lithography template fabrication. Self-assembled multilayer films (molecular rulers) are used in conjunction with photolithographically defined metallic features to generate precise nanogaps with sub- 30-nm resolution on quartz substrates. These nanopatterns are then transferred to the quartz substrates using the metallic thin films as etch masks.

AB - A parallel and economical method for obtaining nanoscale features on large-area quartz substrates has been developed for use in nanoimprint lithography template fabrication. Self-assembled multilayer films (molecular rulers) are used in conjunction with photolithographically defined metallic features to generate precise nanogaps with sub- 30-nm resolution on quartz substrates. These nanopatterns are then transferred to the quartz substrates using the metallic thin films as etch masks.

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DO - 10.1063/1.2963982

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JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 8

M1 - 083123

ER -

Sub- 30-nm patterning on quartz for imprint lithography templates

Abstract

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