Surface charge evolution during early stage of thermal oxidation of silicon

Jianbai Wang, Paul Roman, Emil Kamieniecki, Jerzy Ruzyllo

Research output: Contribution to journalArticlepeer-review

9 Scopus citations


A noncontact method which measures a density of electric charge on the semiconductor surface without bias, and hence, with no electric field in the oxide is used to monitor the evolution of surface charge during an early stage of thermal oxidation of silicon, i.e., from bare surface to oxide about 3 nm thick. It is shown that before positive charge associated with trivalent silicon in the SiO2/Si interface region is established, a surface charge is controlled by a negative charge most likely associated with nonbridging oxygen. A transition between these two regimes takes place in the oxide thickness range of about 1.5-2.5 nm. For oxide above 3 nm thick the surface charge is fully developed and remains constant with an increase of oxide thickness.

Original languageEnglish (US)
Pages (from-to)G63-G65
JournalElectrochemical and Solid-State Letters
Issue number5
StatePublished - May 2003

All Science Journal Classification (ASJC) codes

  • General Chemical Engineering
  • Electrical and Electronic Engineering
  • General Materials Science
  • Electrochemistry
  • Physical and Theoretical Chemistry


Dive into the research topics of 'Surface charge evolution during early stage of thermal oxidation of silicon'. Together they form a unique fingerprint.

Cite this